English to Swedish Tech/Engineering Electronics / Elect Eng nanoelectronics

Förekommer i årsrapport om verksamheten inom de gemensamma företagen för gemensamma teknikinitiativ under 2012. Projektet LENS beskrivs:

"To extend the incumbent immersion lithography technology as far as possible down to the 22 nm technology node, the 12 partners in the LENS project considerably advanced the multiple facets of the technology using double exposure. LENS successfully demonstrated the applicability of the incumbent immersion lithography technology for at least two more technology nodes using dual exposure or pitch doubling techniques, ‘thereby allowing the timely and economically efficient development of the next generations of semiconductor devices."